Professor Hossam Haick has been elected a Fellow of the U.S. National Academy of Inventors (NAI). This prestigious title is considered the highest professional honor awarded to inventors in the United States and worldwide. Haick is a pioneer in identifying molecular signatures of diseases through breath and skin analysis. This breakthrough has enabled the development of rapid, non-invasive diagnostic methods that produce accurate results within minutes and have been validated in numerous clinical centers worldwide.

Haick is a Professor in the Department of Chemical Engineering and the Russell Berrie Nanotechnology Institute at the Technion – Israel Institute of Technology. He is also the director of the institute’s Laboratory of Nanomaterials-based Devices (LNBD). He received his B.Sc. in Chemical Engineering from Ben-Gurion University of the Negev and his Ph.D. in Chemical Engineering from the Technion. He spent two years two years at the Weizmann Institute of Science as well as two years as a Fulbright postdoctoral researcher at the California Institute of Technology-Caltech, before returning as an assistant professor to the Technion.